Entire industry chain model of photoresist, full category of semiconductor photoresist

ArF PhotoresistKrF PhotoresistI-LINE PhotoresistE-beam Photoresist Encapsulation Photoresist

I-LINE Photoresist

Xuzhou Bokang is a Chinese supplier of photoresist from raw materials to finished products.

Focusing on the chemical amplification resist of PHS resin system, including positive resist and negative resist, the thickness range covers 0.3~20um, and has the advantages of high transparency, high aspect ratio, high throughput, etc. Currently, there are 10+ products in the verification  and sales in Chinese IC factories.

Exposure wavelength Product Name Technical nodes and applications Process capability CD Process capability THK Image
I-line 365nm HTI560-0.3 KRF backup 0.35um 0.2-0.4um
I-line 365nm HTI560-0.6 IC general purpose 0.45um 0.6-0.9um
I-line 365nm HTI560-1 IC general purpose 0.5um 0.8-1.2um
I-line 365nm HTI560-2 IC general purpose 0.6um 2.1-3.0um
I-line 365nm HTI560-3A IC general purpose 1um 2.9-4.0um
I-line 365nm HTI560-5D IC general purpose 0.8um 4.0-7.5um
I-line 365nm HTI560-8 IC general purpose, TSV 2um 6.0-8.0um
I-line 365nm HTI560-20C Advanced Packaging Die Cutting 5um 10-17um
I-line 365nm HTI751 IC general purpose 0.5um 0.7-1um
I-line 365nm HTIN174 Compound semiconductor metal lift-off 2um 2.5-5.5um (4inch)
I-line 365nm HTIN1710 Compound semiconductor metal lift-off 6um 6-12um
I-line 365nm HTIN160 Compound semiconductor metal lift-off 0.5um 0.8-7um
I-line 365nm HTIN683 MEMS, micron devices 5um@THK 40um 8-60um
I-line 365nm HTIN161 IC general purpose 0.5um 1um
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