ArF Photoresist
Xuzhou Bokang is a Chinese supplier of photoresist from raw materials to finished products.
Including ArF-immersion (topcoat less) products and ArF-dry products, the resin structure is a methacrylate/acrylate series system, accompanied by functional units such as adamantane, with the characteristics of high resolution, high sensitivity, etc., and technical capability has reached 28nm technology node. At present, 10+ products have been verified by Chinese well-known 12-inch Fab, and some products have received batch orders.
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HTA116
Exposure wavelength: 193nm IMM
Technical nodes and applications: N40nm-14nm PTD L/S
Process capability CD: 0.063um
Process capability THK: 0.16-0.24um -
HTA112
Exposure wavelength: 193nm IMM
Technical nodes and applications: N40nm-14nm PTD C/H
Process capability CD: 0.080um
Process capability THK: 0.13-0.20um -
HTA121
Exposure wavelength: 193nm Dry
Technical nodes and applications: N90-40nm PTD L/S
Process capability CD: 0.08um
Process capability THK: 0.20-0.30um -
HTA1101
Exposure wavelength: 193nm Dry
Technical nodes and applications: N90-40nm PTD C/H
Process capability CD: 0.09um
Process capability THK: 0.15-0.21um -
HTA1123
Exposure wavelength: 193nm Dry
Technical nodes and applications: N90-40nm PTD C/H
Process capability CD: 0.10um
Process capability THK: 0.20-0.30um -
HTA1201
Exposure wavelength: 193nm Dry
Technical nodes and applications: N90-40nm PTD C/H
Process capability CD: 0.10um
Process capability THK: 0.23-0.35um -
HTA2031
Exposure wavelength: 193nm IMM
Technical nodes and applications: N40nm-14nm PTD C/H
Process capability CD: 0.045um
Process capability THK: 0.08~0.10um -
HTA2011
Exposure wavelength: 193nm IMM
Technical nodes and applications: N40nm-14nm PTD C/H
Process capability CD: 0.065um
Process capability THK: 0.09~0.12um
